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    Please use this identifier to cite or link to this item: http://ccur.lib.ccu.edu.tw/handle/A095B0000Q/244


    Title: 以全圖案模仁直接壓印退火金薄膜製作微奈米光柵之成型性分析
    Authors: 李其霆;LI, CI-TING
    Contributors: 機械工程系研究所
    Keywords: 直接金屬奈米壓印;全圖案光柵;光柵成型性;金薄膜/矽基板;有限元素分析;Direct metal nanoimprint;Full pattern grating;Au film / silicon substrate;Grating formability;Finite element analysis
    Date: 2017
    Issue Date: 2019-07-17
    Publisher: 機械工程系研究所
    Abstract: 為了製作液晶螢幕顯示器背光模組中具偏振功能的複合線光柵偏振片(Composite Wire Grid Polarizer),利用直接金屬奈米壓印製程取代半導體產業普遍使用的黃光微影製程製備金屬光柵,再將金屬光柵圖案嵌入透明高分子基材中,達到製作偏振片之目的,可降低製作成本與提高產量。故金屬光柵的成型性為直接金屬奈米壓印製程最關鍵之因素,截至目前直接金屬奈米壓印結果,皆發現光柵邊緣成型性較中央佳,成型高度內外不均勻的現象,所以本研究繼續尋求光柵成型不均勻的原因,並尋求最佳壓印參數及條件。 本研究以電子束微影製作柵狀線寬結構的全圖案矽模仁,300nm、週期600nm之柵狀圖案,深度為200nm。在矽基板上鍍著抗沾黏層與300nm的金薄膜,並且做退火軟化處理,改善金薄膜的壓印特性,增加材料的延性,提高金光柵之成型,以壓印負荷3200 kg,在120℃下進行直接金屬奈米壓印,發現經由退火軟化後的金光柵成型範圍明顯增加,證明退火軟化的金薄膜有助於金光柵的成型。為了探討有無退火的兩批金薄膜對光柵成型的影響,利用SIMUFACT有限元素模擬軟體,以實驗的邊界條件作為基礎,建立直接金屬奈米壓印模型,並將奈米壓痕實驗曲線做為基礎建立退火金薄膜的流應力曲線,以此比較原始金薄膜與退火金薄膜在壓印過程中,兩者受力情形與材料流動對光柵成型的影響,發現位於模齒正下方靠近矽基板處的材料,會形成不易流動的區域,而該區域為影響光柵成型的原因,因退火金薄膜在該區能夠流動的材料比原始金薄膜多,故填入模穴成型的材料就越多,故退火金薄膜的成型性會較佳。
    In order to fabricate composite wire grid polarizers (WPG) for polarization of liquid crystal display (LCD) we adopted the direct metal nanoimprint technique, which might replace photolithography, to fabricate metal grating in submicron scale. To allow a direct nanoimprint having good fidality, the metal grating formability is the most important factor in the direct metal nanoimprint processing. Previous results showed that the formability was better in the periphery of the grating than in the center. To deal with the non-uniform imprint result, we try to find a feasible approach to improve the process.In this study, the silicon molds with full patterned grating structure are made by E-beam lithography and dry etching with a width of 300 nm and a spacing of 600 nm and height of 200 nm. Gold thin film was used as imprint material for the grating pattern. The silicon substrates are covered with an anti-sticking layer prior to the evaporation of 300 nm-thick-gold thin film. To facilitate an easier flow and thus a better formability of the gold film during imprint, some films were annealed after evaporation deposition for comparison . The direct nanoimprint was conducted with a load of 3200 kg at 120℃. The successful experimental results reveal better formability of the annealed gold films.To analyze the formability of as-received and annealed gold films, commercial software SIMUFACT based on the finite element method was applied to simulate the metal flow process during imprint. The flow stress curves of the as-received and of the annealed Au film were obtained from the nanoindentation curves. Comparing the results between as-received Au film and annealed one, we found an interesting factor that may influence the formability. The material immediately beneath the mold teeth and adjacent to the substrate formed an area similar to a dead zone.Since annealed gold film was easier to fill the mold cavity than the as-received one, the formability during direct metal imprint was improved.
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